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卓越论坛(第7期)预告|Quantitative Analysis of Selective Evaporation Characteristics for Binary Mixture Droplets with SPR Imaging Technology (Seong Hyuk LEE)
发布时间:2024-01-09        作者:        编辑:贾继伟       浏览:

报告题目 Quantitative Analysis of Selective Evaporation Characteristics for Binary Mixture Droplets with SPR Imaging Technology

时间20241月10日(星期三)13:30-15:00

地点:机械材料馆529

报告人Seong Hyuk LEE 韩国中央大学教授

主持人:辛元洙

报告人简介

Seong Hyuk Lee教授是韩国中央大学教授,韩国中央大学多维电池研究所所长,韩国机械工程师协会热流体部门副理事长,亚洲液体雾化和喷雾系统国际会议副主席,Institute for Liquid Atomization and Spray System KOREA的主编,许多国际期刊的副主编及委员。主持韩国国家能源部基金,韩国国家自然科学基金等科研项目30余项,获各种科研奖励10余项,在国内外重要期刊上发表学术论文100余篇。研究领域包含计算流体力学与多物理场模拟蒸发与冷凝传热纳米尺度能量输运流动可视化等方面。


报告摘要

    The evaporation of droplet array has been used for a surface coating to manufacture printed electronics. During evaporation, various phenomena occur, such as contact line behavior, internal flow motions, and vapor transport. While the multiple droplets are evaporating, in particular, their mutual interactions suppress the local evaporation flux because of vapor accumulation. The decrease in local evaporation flux also affects the internal flow fields and local liquid concentration, especially for the binary mixture droplets (BMDs). For BMDs, more volatile components evaporate faster, and so-called selective evaporation occurs. The in-situ measurement of local concentration during evaporation is thus essential to understanding the solutal Marangoni flow motion inside BMDs, strongly related to the surface tension gradient. Today, the present talk introduces the quantitative analysis of selective evaporation that occurs while BMDs evaporate with the use of SPR imaging to measure the concentration near the wall. Also, this talk will show the dynamics of the contact line behavior of the multiple BMDs.


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